Ni／NiO界面的高场磁化研究  

APPROCHING TO SATURATION OF Ni/NiO INTERFACE

作　　者：王文鼐[1] 蒋正生[1] 桑海[1] 程光熙 葛翔 都有为[1] 

机构地区：[1]南京大学固体微结构国家重点实验室

出　　处：《物理学报》1996年第1期140-145,共6页Acta Physica Sinica

摘　　要：报道在表面包覆ＮｉＯ的Ｎｉ超微颗粒和Ｎｉ／ＮｉＯ多层膜中Ｎｉ／ＮｉＯ界面的磁性实验结果．在Ｔ＜８０Ｋ下Ｎｉ／ＮｉＯ界面存在较大的磁化强度（Ｈ＝４０ｈＯｅ），并随温度上升而快速下降．对高场磁化（５－６５ｈＯｅ）实验数据进行拟合，结果表明Ｎｉ／ＮｉＯ界面存在类似磁矩排列不一致的结构．The magnetic properties investigated by experiment on the Ni/NiO interface of Ni/NiOmulti-thin layers and surface-NiO-coated Ni ultra fine particles are reported. At temperaturesbelow 80 K, an abnormal enhanced magnetization under external magnetic 'field (H = 40hoe) was found. The enhanced magnetization decreases quickly with temperature increasing.The high field (5-65 hOe) magnetization (approching to saturation) of ultrafine particlesand multi-thin layers were also measured. The fit results for experimental data indicate thatthe interface Ni/NiO in Ni/NiO UFP and Ni/NiO ML have inhomogenous spin structure.

关 键 词：多层膜 镍/氧化镍 界面 磁化强度 

分 类 号：O484.43[理学—固体物理]