离子束增强沉积TiB_2薄膜的耐蚀性能研究  

STUDY OF CORROSION RESISTANCE OFTiB_2 THIN FILMS ON COPPER BY ION BEAM ENHANCEMENT DEPOSITION

作　　者：白新德[1] 王社管[1] 范毓殿[1] 况圆珠[1] 尤大纬[1] 

机构地区：[1]清华大学,中国科学院空间科学与应用研究中心

出　　处：《中国空间科学技术》1996年第1期64-69,共6页Chinese Space Science and Technology

基　　金：国家自然科学基金

摘　　要：研究了在紫铜基材上用离子束增强沉积法（ＩＢＥＤ）沉积ＴｉＢ２薄膜后，在６００，７００和８００℃的空气中氧化的动力学曲线；在ＩＮＨ２ＳＯ４溶液中，用动电位扫描法测定了其极化曲线和极化阻力，用ＳＥＭ观察了其形貌，用俄歇电子谱仪（ＡＥＳ）分析了膜的成份，用Ｘ－射线衍射仪（ＸＲＤ）研究了膜的微观结构；讨论了ＴｉＢ２薄膜具有优良耐蚀性的机理。iB2 films are deposited onto copper and silicon substrates byIon Beam Enhancement Deposition.The oxidation resistance in air at 600 C,700℃ and 800 C and the electrochemical corrosion resistance in 1N H12So4 aqueous solution of these films are measured.SEM,AES and XRD are employed toinvestigate the morphology,the chemical composition distribution and the microstructure.It is concluded that,1)the TiB2 films by IBED are of good oxidation resistance in high temperature air and of good corrosion resistance in 1NH2SO4 aqueous solution;2)the oxidation and corrosion resistance of the filmsdeposited under the bombardment of enbancement ion beam are better than thatdeposited without the bombardment;3)the bombardment of enhancement ionbeam promotes the formation of TiB2 crystalline particles in their amorphousfilms.

关 键 词：薄膜 离子束淀积 性能试验 二氧化钛 

分 类 号：TG174.44[金属学及工艺—金属表面处理]