脉冲激光沉积(PLD)原理及其应用  

Application and Mechanism Analysis of Pulsed Laser Deposition

作　　者：唐亚陆[1] 杜泽民[2] 

机构地区：[1]昆明理工大学光电子新材料研究所 [2]淮安军星科技学校,江苏淮安223001

出　　处：《桂林电子工业学院学报》2006年第1期24-27,共4页Journal of Guilin Institute of Electronic Technology

摘　　要：脉冲激光沉积薄膜是近年来发展起来的使用范围最广,最有希望的制膜技术。通过从激光与材料相互作用理论出发,分析了激光烧蚀材料等离子体羽辉的空间运动特征与成分分布,以LCM O为对象,对PLD系统脉冲激光沉积薄膜过程中薄膜质量与衬底温度、靶材-衬底距离、氧压、激光脉冲能量、激光频率等参数关系进行了实验研究,得出在单晶衬底上沉积LCM O薄膜的最佳实验参数。同时用XRD衍射谱和SEM分别对膜的成键情况和表面形貌作了分析,结果表明脉冲激光沉积(PLD)是一种很好的镀膜方法,所制备的膜质量较好。Pulsed laser deposition is the most widely used and promising deposition technique for the growth of thin films developed in the recent years. In light of the theory of interaction between laser and material, I conduct an analysis into the spatial features and the distribution of composition of plume. The effects of deposition parameters including the substrate temperature, the target-substrate distance, ambient oxygen pressure, pulse laser energy and laser frequency on the deposition characteristics of LCMO thin film developed on LaAlO3 substrate were tentatively investigated. The optimized experimental parameters are obtained. We characterized the surface morphology and bonding of the film by X-ray diffraction and scanning electron microscopy. Experiments results indicate that the film is of high quality, which proves that PLD is a good technique.

关 键 词：PLD系统 等离子体 准分子激光 最佳实验参数 

分 类 号：TN241[电子电信—物理电子学]