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作 者:陈利[1] 吴恩熙[1] 尹飞[1] 王社权[1] 汪秀全[1]
机构地区:[1]中南大学粉末冶金国家重点实验室
出 处:《中国有色金属学报》2006年第2期279-283,共5页The Chinese Journal of Nonferrous Metals
摘 要:采用EPMA、XRD、SEM、TEM、HR-TEM、EDX、纳米压痕、氧化实验和切削实验研究了磁控溅射在硬质合金基体上沉积TiN涂层和(Ti,Al)N涂层的微观组织结构和性能。结果表明:TiN涂层晶粒为喇叭口柱状晶,(Ti,Al)N涂层为面心立方平直柱状晶,由于固溶了Al元素,(Ti,A l)N涂层呈(200)面择优生长;(Ti,Al)N涂层在硬质合金基体上无外延生长;(Ti,Al)N涂层在800℃氧化后形成Al2O3/TiO2/(Ti,Al)N的分层结构;(Ti,Al)N涂层具有更高的硬度和更好的切削性能。The properties of magnetron sputtered TiN and (Ti, Al)N coatings grown on cemented carbide substrates were studied by electron probe microanalysis (EPMA), X-ray diffractometry (XRD), scanning electron microscopy (SEM), nanoindentation, energy dispersive X-ray spectroscopy (EDX), oxidation experiment and cutting tests. The results show that TiN coating is bell mouth columnar structures and (Ti, Al)N coating is fcc straight columnar structures. The (Ti, Al)N coating shows a fairly strong (200) preferred orientation because Ti atoms in the TiN lattice are substituted by Al atoms. The epitaxial growth is not found between (Ti, Al)N coating and substrate. The (Ti, Al)N coating becomes Al2O3/ TiO2/(Ti, Al)N multilayer after oxidated at 800℃. The (Ti, Al)N coating exhibits higher hardness, excellent cutting performance compared with TiN coating.
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