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作 者:Takashi MAEKAWA Hitoshi TANAKA Masaki UCHIDA Tomokazu YOSHINAGA
机构地区:[1]Graduate School of Energy Science,Kyoto University,Kyoto 606-8502,Japan
出 处:《Plasma Science and Technology》2006年第1期95-98,共4页等离子体科学和技术(英文版)
基 金:supported in part by the JSPS-CAS Core University Program in the field of Plasma and Nuclear Fusion
摘 要:By ECH under a steady By field, a closed field equilibrium of a low aspect ratio as low as R/a = 1.4 is spontaneously formed in the LATE device. After the spontaneous formation, the plasma current has increased further up to Ip = 7.2 kA by 2.45 GHz, 30 kW and Ip = 11 kA by 5 GHz, 120 kW, by increasing the microwave power with a slow ramp of By for the equilibrium of the plasma loop at larger currents. Both amount to 12% of the total toroidai coil current. ECH/ECCD at 2nd harmonic resonance of EBW supports the plasma. An outline of the theoretical considerations for the formation process is presented.By ECH under a steady By field, a closed field equilibrium of a low aspect ratio as low as R/a = 1.4 is spontaneously formed in the LATE device. After the spontaneous formation, the plasma current has increased further up to Ip = 7.2 kA by 2.45 GHz, 30 kW and Ip = 11 kA by 5 GHz, 120 kW, by increasing the microwave power with a slow ramp of By for the equilibrium of the plasma loop at larger currents. Both amount to 12% of the total toroidai coil current. ECH/ECCD at 2nd harmonic resonance of EBW supports the plasma. An outline of the theoretical considerations for the formation process is presented.
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