光滑硬质合金衬底渗硼预处理对CVD金刚石薄膜性能的影响  

Influence on the Performance of CVD Diamond Films by Boronizing on Smooth Cobalt-cemented Tungsten Carbide

作　　者：王勇[1] 马玉平[1] 孙方宏[1] 张志明[1] 陈明[1] 

机构地区：[1]上海交通大学,上海200030

出　　处：《中国机械工程》2006年第5期545-548,共4页China Mechanical Engineering

基　　金：国家自然科学基金资助项目(50575135;50275095);国家863高技术研究发展计划资助项目(2002AA302613)

摘　　要：提高金刚石薄膜的附着力和光洁度是实现CVD金刚石涂层在工模具和耐磨器件领域中广泛应用的关键因素。采用热丝CVD法在光滑WC-Co硬质合金基体表面沉积金刚石薄膜,研究了渗硼预处理新方法对光滑衬底表面抑制Co催石墨化作用和保证金刚石涂层附着力的效果。研究结果表明,采用渗硼预处理方法既能避免研磨、刻蚀和化学腐蚀等加工方法对光滑衬底表面的严重损伤,又能有效抑制Co对金刚石薄膜的不利影响,获得了满足附着力要求的光滑金刚石薄膜,对于拓宽金刚石薄膜的应用领域具有重要意义。Improving adhesion and roughness of diamond films on WC--Co substrates is the key factor in extensive applications of diamond films. A pretreatment way of boronizing on smooth cobalt --cemented tungsten carbide to improve adhesion and roughness of diamond films had been introduced. A surface layer of stable cobalt borides was formed, and this layer can effectively prevent the diffusion of the cobalt from the surface when diamond films were deposited. On the other hand, this kind of way can protect the fineness of substrate surface well. Results show that under premise of the good adhesion between substrate and diamond film, the roughness of diamond films has been improved effectively. It is of great significance for the industrialization of diamond films.

关 键 词：金刚石薄膜 渗硼 光滑 附着力 

分 类 号：TG174.4[金属学及工艺—金属表面处理]