用电沉积法制备非晶态镍磷合金的工艺研究  

Preparation of Amorphous Nickel-Phosphorus Alloy Coating by Electroplating

作　　者：刘应科[1] 程英亮[1] 张昭[2] 王慧敏[1] 陈振华[1] 吴有伍[1] 

机构地区：[1]湖南大学材料科学与工程学院,湖南长沙410082 [2]浙江大学化学系,浙江杭州310027

出　　处：《材料保护》2006年第3期32-35,共4页Materials Protection

摘　　要：为了获得高性能的镍磷合金镀层,对次磷酸盐镍盐体系电沉积法制备非晶态镍磷合金的工艺以及镀层性能进行了研究。进行了7因素3水平的正交试验,试验因素分别为:温度、电流密度、pH值、硫酸镍浓度、氯化镍浓度、磷酸浓度、次磷酸钠浓度。结果表明,获得最佳耐腐蚀镀层的工艺条件为:150g/L磷酸镍,电流密度4A/dm2,pH=2,温度68℃,11g/L氯化镍,7g/L次磷酸钠,45mL/L磷酸。获得最佳硬度镀层的工艺条件为:温度68℃,150g/L硫酸镍,pH=2.5,6g/L次磷酸钠,电流密度6A/dm2,50mL/L磷酸,11g/L氯化镍。Electroplating amorphous nickel-phosphorus alloy coating technology was studied in hypophosphite-nickel salt bath, and the performances of coating were also investigated. Orthogonal tests of 7 factors and 3 levels were carried out in which the!7 factors were temperature, current density, pH value, NiSO_4·6H_2O, NiCl_2·6H_2O, H_3PO_4, and NaH_2PO_2.H_2O. The processing parameters for Ni-P plating with optimum corrosion resistance are that temperature is 68 ℃, current density is 4 A/dm2, pH value is 2, NiSO_4·6H_2O is 150 g/L, NiCl_2·6H_2O is 11 g/L, NaH_2PO_2·H_2O is 7 g/L, and H_3PO_4 is 45 mL/L, but the conditions for the hardest coating are temperature is 68 ℃, current density is 6 A/dm2, pH value is 2.5, NiSO_4·6H_2O is 150 g/L, NiCl_2·6H_2O is 11 g/L, NaH_2PO_2·H_2O is 6 g/L, and H_3PO_4 is 50 mL/L.

关 键 词：镍磷合金 非晶态 电沉积 正交试验 

分 类 号：TQ153[化学工程—电化学工业]