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作 者:颜为军[1] 徐自力[1] 谢超[1] 杨秋景[1] 李文艳[1] 黎娜[1] 刘星娟[1] 杜尧国[1]
出 处:《吉林大学学报(理学版)》2006年第2期303-307,共5页Journal of Jilin University:Science Edition
基 金:国家自然科学基金(批准号:20277015)
摘 要:以TiO2/SiO2为光催化剂,在紫外光作用下,讨论了NO2存在时,庚烯在TiO2/SiO2上的吸附和光催化降解作用.通过GC-MS和FT-IR,分别测定了3种不同体系的反应产物,从而推测出可能的反应机理.实验结果表明,TiO2/SiO2对庚烯的最大吸附量Mmax=3.10 mg,当存在NO2(44.64μmol/L)时Mmax=3.80 mg.在光催化降解庚烯的反应中,当NO2加入量较大(NO2≥89.28μmol/L)时,庚烯降解反应速率加快,但矿化度比无NO2时的小.The adsorption and photoeatalytie degradation of heptene on TiO2/SiO2 photoeatalyst under the irradiation of UV light were investigated carefully in the presence of NO2. By means of GC-MS and FT-IR, we respectively determined the intermediate products of the three different reaction systems, and accordingly deduced the possible reaction mechanisms. The experiment data indicate that Mmax= (the maximum adsorption amount of TiO2/SiO2 for heptene ) is 3. 10 mg, and is increased to 3.80 mg in the presence of NO2 (44. 64 μmol/L). In the photocatalytic degradation of heptene, addition of a large amount of NO2 (NO2≥89. 28 μmol/L) can accelerate the photodegradation reaction rate of heptene, but its mineralization degree with the addition of NO2 is lower than that without the addition of NO2.
分 类 号:X505[环境科学与工程—环境工程]
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