复合抛光对CVD金刚石薄膜表面光洁度的改进研究  

Improvement Smoothness of CVD Diamond by Composite Polishing

作　　者：苏青峰[1] 夏义本[1] 王林军[1] 史伟民[1] 

机构地区：[1]上海大学材料科学与工程学院电子信息材料系,上海200072

出　　处：《无机材料学报》2006年第2期499-502,共4页Journal of Inorganic Materials

基　　金：国家自然科学基金(60277024)上海应用材料研究与发展基金上海市纳米专项(0452nm051)上海市重点学科(T0101))资助

摘　　要：采用激光抛光和热化学抛光相结合的方法,对通过热丝CVD方法生长的金刚石薄膜进行了复合抛光处理．并利用X射线衍射仪(XRD)、拉曼光谱仪(Raman)、扫描电子显微镜 (SEM)和原子力显微镜(AFM)对金刚石薄膜进行了表征．结果表明,所合成的金刚石薄膜是高质量的多晶(111)取向膜;经复合抛光后,金刚石薄膜的结构没有因抛光而发生改变,金刚石薄膜的表面粗糙度明显降低,光洁度大幅度提高,表面粗糙度Ra在100nm左右,基本可以达到应用的要求．Diamond films prepared by hot filament chemical vapor deposition （CVD） were polished by a composite technique of laser polishing and hot chemical polishing. The surface morphology and microstructure of the films were characterized by X-ray diffraction （XRD）, Raman, scan electron microscopes （SEM） and atomic force microscopes （AFM）. The measurement results of the diamond films before and after composite polishing show that the diamond films are high quality （111）-oriented polycrystalline diamond films. The roughness of the diamond films is decreased obviously and is in the order of 100 nm after polishing. The microstructure of the diamond films can＇t be changed by composite polishing. All the results obtained indicate that the composite polishing technique is an effective way for diamond surface disposal.

关 键 词：CVD金刚石薄膜 复合抛光 表面粗糙度 

分 类 号：O485[理学—固体物理] TN305[理学—物理]