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作 者:王旭东[1] 俞宏英[1] 孙冬柏[1] 孟惠民[1] 樊自拴[1]
机构地区:[1]北京科技大学腐蚀与防护中心,北京100083
出 处:《材料科学与工艺》2006年第2期215-217,共3页Materials Science and Technology
摘 要:采用电化学沉积方法,在不同的工艺条件下,制备块状非晶态N i-P合金,并研究了工艺条件和磷含量对块状N i-P合金结构的影响.结果表明,电化学沉积制备块状非晶态N i-P合金的方法是可行的,较低的pH值、较高的温度和较低的阴极电流密度更有利于非晶态结构的形成.试验中还发现,磷含量是决定块状N i-P合金结构的主要因素,随着磷含量的增加,块状N i-P合金由晶态向非晶态结构转变.Bulk amorphous Ni -P alloys were prepared at various technology conditions by electrochemical deposition, and the effects of technology conditions and phosphorus contents on the bulk Ni - P alloy structures were also studied. The results showed preparation of bulk amorphous Ni - P alloy by electrochemical deposition was validated. It was indicated that lower pH value, higher temperature, and lower cathodic current density could promote the formation of the amorphous structure. The bulk Ni - P alloy structures were also found to be very phosphorus content dependent, and bulk Ni - P alloys transformed from the crystal to the amorphous structure with an increase in phosphorus content.
分 类 号:TG132.2[一般工业技术—材料科学与工程]
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