制备态Fe_(21)Ni_(79)/Cu/Fe_(21)Ni_(79)三明治薄膜的纵向巨磁阻抗效应  

Longitudinal Giant Magneto-Impedance in As-deposited Fe_(21)Ni_(79)/Cu/Fe_(21)Ni_(79) Sandwiched Films

作　　者：商干兵[1] 周勇[1] 丁文[1] 余先育[1] 曹莹[1] 周志敏[1] 

机构地区：[1]上海交通大学微纳科学技术研究院,微米/纳米加工技术国家级重点实验室,薄膜与微细技术教育部重点实验室,上海200030

出　　处：《磁性材料及器件》2006年第2期14-17,共4页Journal of Magnetic Materials and Devices

基　　金：国家自然科学基金项目(50275096);上海市纳米专项资助项目(0352nm014);教育部科学技术研究重大项目资助项目(重大0307)

摘　　要：采用直流电镀结合正胶光刻工艺制备了Fe21Ni79／Cu／Fe21Ni79三明冶薄膜，并在0．1-40MHz范围内研究了它的纵向巨磁阻抗效应特性。实验结果表明，Fe21Ni79／Cu／Fe21Ni79三明治薄膜有十分明显的纵向GMI效应，GMI先随外加磁场的增高而迅速增大，在Hext=0.96kA／m达到最大值后开始逐渐下降．在频率为1．2MHz，外加磁场为0．96kA／m时薄膜的纵向GMI最大值达到88．3％．Fe21Ni79/Cu/Fe21Ni79 sandwiched films were prepared by DC-electroplating incorporated with positive photoresist lithography technique on glass substrate. The longitudinal giant magneto-impedance （GMI） was measured in the frequency range of 0. 1-40MHz. The results show that Fe21Ni79/Cu/Fe21Ni79 sandwiched films exhibit obvious longitudinal GMI, and the longitudinal GMI increases rapidly with increasing applied field Hext, reaching a positive maximum at Hext=0.96kA/m, and then decreases with further increasing Hext. In addition, the maximum longitudinal GMI of 88.3% occurs at the frequency of 1.2MHz and Hext=0.96kA/m.

关 键 词：FeNi/Cu/FeNi三明治薄膜 纵向巨磁阻抗效应 各向异性场 横向有效磁导率 

分 类 号：O484.43[理学—固体物理]