钨酸钠浓度对Ni-Co-W-P合金镀层性能的影响  

The Influence of Sodium Tungstate Concentration on Properties of Electroless-deposited Ni-Co-W-P Alloy Coating

作　　者：周泽翔[1] 薛理辉[1] 许帅[1] 官建国[1] 程海斌[1] 

机构地区：[1]武汉理工大学材料复合新技术国家重点实验室,湖北武汉430070

出　　处：《电镀与精饰》2006年第3期38-40,46,共4页Plating & Finishing

基　　金：国家高新技术研究发展(863)计划项目(2002AA214061);武汉理工大学基金资助

摘　　要：用扫描电镜、振动样品磁强计等实验手段研究了化学镀液中钨酸钠浓度对N i-T i合金丝表面化学镀N i-Co-W-P薄膜形貌及性能的影响。结果表明:镀膜的形貌、沉积速度、磁性能与钨酸钠浓度紧密相关,当浓度合适时,可以获得理想的性能。Ni-Co-W-P films were electroless-deposited on Ni-Ti alloy filament. The Ni Co W-P films were tested by means of VSM and SEM. The results show that the morphology, deposition rate, magnetic properties of film electroless-deposited are strongly correlative with the concentra tion of sodium tungstate, and the expected properties were obtained in a certain point.

关 键 词：Ni—Ti合金丝 Ni—Co—W—P薄膜 化学镀 磁性能 

分 类 号：TQ153.2[化学工程—电化学工业]