用沉积－扩散法生产Fe－65mg·g^（－1）Si合金薄带的扩散过程计算机模拟  

COMPUTER SIMULATION ON THE DEPOSITION-DIFFUSION PROCESS IN F_e-65_(mg)·g￣(-1) Si ALLOY THIN RIBBON

作　　者：王沿东[1] 徐家桢[1] 左良 梁志德 

机构地区：[1]东北大学

出　　处：《材料研究学报》1996年第2期125-129,共5页Chinese Journal of Materials Research

基　　金：国家教委资助

摘　　要：沉积－扩散法是制备特殊材料的有效方法之一用计算机模拟研究了沉积一扩散法生产Ｆｅ－６５ｍｇ·ｇ－１Ｓｉ合金薄带的工业可行性及热处理工艺条件（温度、气氛浓度、时间等）的影响计算结果表明：沉积一扩散法制造工业用Ｆｅ－６５ｍｇ·ｇ－１Ｓｉ合金薄带是完全可行的；The 'deposition-diffusion' method has now been used as an important approach to the preperation of some spotal materials. In this paper, its industrial applicabitity in the production of Fe-65 mg·g-1 Si alloy thin ribbons under various heat treatment condition (such as different temperatures, furnace atmospheres, diffusion time, etc.) is demonstrated through the computer simulations. It is shown that compared to the so-called 'one step diffusion' method, the 'two step diffusion' method may reduce considerably the production time.

关 键 词：软磁合金 扩散法 计算机模拟 铁硅合金 薄带 

分 类 号：TG132.271[一般工业技术—材料科学与工程]