PCVD低水峰光纤的制备与性能  

Fabrication and properties of PCVD Low water peak fiber

作　　者：韩庆荣[1] 谢康[2] 张树强[2] 罗杰[2] 

机构地区：[1]武汉理工大学材料学院,武汉430070 [2]长飞光纤光缆有限公司研发部,武汉430073

出　　处：《光通信技术》2006年第5期56-58,共3页Optical Communication Technology

摘　　要：介绍了PCVD低水峰光纤生产工艺和其材料组成、结构及性能,在生产普通单模光纤的基础上,通过优化PCVD工艺,成功抑制了普通单模光纤在1383nm由于羟基(OH)吸收造成的水峰损耗。光纤中功能梯度的芯层和光学包层、高纯均匀的机械包层和性能优越的双层涂覆层,使PCVD低水峰光纤各项性能指标全面达到或优于最严格的ITU-TG.652.C/D和IEC60793-2-50B.1.3光纤标准要求。This paper has introduced the fabrication process, material composition and structure as well as properties of PCVD low water peak fiber. Through process optimization for PCVD based process, the water peak that occurs around 1383nm in conventional single-mode fiber due to hydroxyl （OH） ions absorption has been suppressed successfully. The functional graded core and optical cladding, high purified and homogeneous mechanical cladding as well as double layer coating with outstanding performance have ensured that PCVD low water fiber complies with or exceeds the ITU recommendation G.652 （C and D） and IEC 6093-2-50 type B1.3 optical fiber specification.

关 键 词：PCVD低水峰光纤 PCVD工艺 ITU-T G.652.C/D IEC 6079 3-2-50 B.1.3 

分 类 号：TN929.11[电子电信—通信与信息系统]