钨针尖放电处理后的场发射特性  

Field Emission Properties of a Tungsten Tip after Discharge Treatment

作　　者：陶雄[1] 张兆祥[1] 王鸣生[1] 吴越[1] 张耿民[1] 

机构地区：[1]教育部纳米器件物理与化学重点实验室,北京大学信息科学技术学院电子学系,北京100871

出　　处：《北京大学学报（自然科学版）》2006年第3期385-387,共3页Acta Scientiarum Naturalium Universitatis Pekinensis

基　　金：国家自然科学基金资助项目(60471008和60231010)

摘　　要：在场发射显微镜(FEM)中使用1万伏以上的电压对钨针尖进行了放电处理。扫描电子显微镜(SEM)和透射电子显微镜(TEM)的观察表明在处理后形成了纳米尺寸的突起。从经过处理的钨针尖能够支取高达1.55mA的场发射电流。针尖的场发射像呈现四重对称,表明它来自单个突起。场发射电流与电压关系符合Fowler-Nordheim(F-N)理论。根据F-N理论算得的场发射面积与TEM下观察到的突起的面积在量级上一致。A tungsten tip received discharge treatment under a high voltage over 10 kV in a field-emission microscope （FEM）. Scanning electron microscopy （SEM） and transmission electron microscopy （TEM） observation showed that some nanometer-scale protrusions resulted from the discharge treatment. The post-treatment tungsten Lip delivered a field emission current as high as 1.55 mA. The FEM pattern of the tip demonstrated a four-fold symmetry and thus the field emission was attributed to a single protrusion. The dependence of the field emission current on the applied voltage approximately followed the Fowler-Nordheim （F-N） theory. The value of the emission area calculated by the F-N theory is in agreement with that obtained from the TEM observation in the order of magnitude.

关 键 词：钨针尖 场发射 电弧放电 

分 类 号：O462.4[理学—电子物理学]