Fe(NO_3)_3浓度对水热法腐蚀多孔硅的影响  

The Effect of the Fe(NO_3)_3 Concentration in Producing Porous Silicon by Hydrothermal Etching

作　　者：赵韦人[1] 陈景东[1] 丁娟[1] 陈绍军[1] 

机构地区：[1]汕头大学物理系,广东汕头515063

出　　处：《汕头大学学报（自然科学版）》2006年第2期43-48,共6页Journal of Shantou University：Natural Science Edition

基　　金：国家自然科学基金资助项目(No:50001010)

摘　　要：用水热腐蚀法,通过改变腐蚀液中Fe(NO3)3的浓度,制备多孔硅样品.用扫描电子显微镜、荧光分光光度计和傅立叶红外光谱仪对样品微结构和光学特性进行检测,并结合Islam-Kumar模型对检测结果进行分析.结果表明,增大腐蚀液中Fe(NO3)3浓度,可加快腐蚀速度,并使多孔硅中纳米硅尺寸减小,比表面积增大,从而引起样品发射峰发生蓝移,且对应于Si‖O键的红外吸收增强.Three porous silieon（PS） are prepared by Hydrothermal Etching with different Fe（NO3）3 solution concentration. All the samples are studied with Scanning Electron Microscope, Fluorescence Spectrophotometer, and Fourier Transform Infrared Spectrometer. Moreover, the PLs are analvzed with the mode of Islam and Kumar. Both the experiment results and simulation meet very well. And it is also shown that higher the concentration of Fe（NO3）3 solution will result in a higher erode rate, smaller nano silicon particle dimension, higher PL peak energy, and stronger Si=O bond infrared absorption.

关 键 词：多孔硅 纳米硅 水热腐蚀法 光致发光 Si=O键 

分 类 号：O482.31[理学—固体物理]