静电雾化技术在纳米薄膜制备中的应用研究  

Research on the Fabrications of Nano-Metric ThinFilms by Electrostatic Spray Deposition Techniques

作　　者：许高斌[1] 褚家如[1] 

机构地区：[1]中国科技大学精密机械与精密仪器系

出　　处：《微纳电子技术》2006年第6期284-288,306,共6页Micronanoelectronic Technology

基　　金：中国科学院博士点基金资助项目(20030358018);安徽省教育厅自然科学重点科研计划项目资助(2006KJ026A)

摘　　要：对静电雾化的基本概念、原理和典型喷洒模式作了介绍,对静电雾化技术在纳米薄膜制备中的应用进行了阐述,最后对静电雾化技术在薄膜制备中存在的问题和影响薄膜微观结构和性能的因素作了总结。The basic conception, principle of operation, and the main functioning modes of electrostatic spray were introduced. The applications and the problems in fabrications of nano-metric thin films by ESD techniques were discussed. The critical factors, effects on the microstructures and properties of the nano-metric thin films are also given.

关 键 词：静电雾化 纳米材料 工艺参数 薄膜制备 

分 类 号：TN304.055[电子电信—物理电子学] TF123.112[冶金工程—粉末冶金]