掺铒高硅氧玻璃光谱性质的研究  

Specltal properties of Er^(3+) doped high silica glass

作　　者：达宁[1] 杨旅云[1] 彭明营[1] 孟宪庚[1] 周秦岭[1] 陈丹平[1] 赤井智子[2] 角野广平[2] 

机构地区：[1]中国科学院上海光学精密机械研究所 [2]日本产业技术综合研究所

出　　处：《物理学报》2006年第6期2771-2776,共6页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:50125258和60377040);上海市科委纳米专项(批准号:0352nm042)资助的课题~~

摘　　要：应用Judd-Oflet理论计算了新型掺铒高硅氧玻璃中铒离子的强度参量Ωt(t=2,4,6),Ω2=8·15×10-20,Ω4=1·43×10-20,Ω6=1·22×10-20,相比于其他氧化物玻璃,表现出较大的Ω2,6值,反映了铒离子周围的近邻结构不对称性和Er-O键的离子键成分较高.利用McCumber理论计算得到了能级4I13/2→4I15/2跃迁的受激发射截面为σc=0·51pm2.这种高硅氧玻璃掺铒离子浓度尽管高于石英光纤的掺杂浓度10倍左右,其荧光寿命和量子效率仍达到6·0ms和66·0%,有可能成为新的光学放大和微片激光材料.The Judd-Ofelt intensity parameter Ωt of a novel Er^3＋ doped high silica glass was calculated. The large values of Ω2,6 （Ω2 = 8.15 × 10^-20, Ω6 = 1.22×10^-20） indicate that the local structure of Er^3＋ has higher asymmetry and lower covalency than other oxide glasses. McCumber theory was used to calculate the stimulated emission cress section of 4I13/2→4 I15/2 transition, the result was 0.51pm^2 . Despite the Er^3＋ -doped concentration in high silica glass being about ten times greater than that in silica fiber, its fluorescence lifetime and quantum efficiency were 6.0ms and 66.0%, respectively. This novel Er^3＋ -doped glass can be used in optical amplification and micrechip laser.

关 键 词：掺铒高硅氧玻璃 JUDD-OFELT理论 量子效率 

分 类 号：O433.4[机械工程—光学工程]