吸附溶出伏安法测定痕量钒  

Determination of Trace Vanadium by Adsorptive Stripping Voltammetry

作　　者：周连君[1] 尤进茂[1] 李怀娜[1] 蔡玉钦[1] 周奇志[1] 

机构地区：[1]曲阜师范大学化学系

出　　处：《冶金分析》1996年第3期17-19,共3页Metallurgical Analysis

摘　　要：在０．０１ｍｏｌ／ＬＨａｃ－ＮａＡｃ和１．２×ｌ０－５ｍｏｌ／Ｌ乙醛酸缩氨基硫脲（ＧＡＴＳＣ）体系中，Ｖ（Ⅴ）产生一灵敏的还原波，峰电位是－０．８９ｖ（υｓ．ＳＣＥ），峰高与Ｖ（Ⅴ）的浓度在２．０×１０－８～１．６×１０－６ｍｏｌ／Ｌ范围内呈直线关系，检测限是６０×１０－９ｍｏｌ／Ｌ。A new method for determination of trace vanadium is described.In 0.01mol/L HAc-NaAc and 1.2×10-5mol/L glyoxalic acid thiosemicarbazone(GATSC) solution,vanadium(V) produces a very sensitive reduction peak.the peak potenital of the wave is-0.89(vs.SCE).The change of the peak height with concentration of vanadium is linear in the range of 2.0×10-8-1.6×10-6mol/L.The detection limit is 6.0×10-9mol/L.

关 键 词：钒 吸附溶出伏安法 

分 类 号：O614.511[理学—无机化学] O657.1[理学—化学]