近红外光上转换发光显示器中干涉过滤膜的设计  

Interference Filters in the Optically Written Display Based on Up-conversion of Near Infrared Light

作　　者：陈瑞改[1] 王琼华[1] 辛燕霞[1] 

机构地区：[1]四川大学电子信息学院,成都610064

出　　处：《光子学报》2006年第6期863-866,共4页Acta Photonica Sinica

摘　　要：介绍了近红外光上转换发光显示器的结构及其原理，为了进一步提高该显示器的亮度等性能并避免近红外光从屏上泄露，根据多层干涉过滤膜设计原理设计了该显示器所需的两个多层干涉过滤膜：一个为在可见光420-800nm短波段高反射，近红外光800～1000nm长波段高透射特性的LP膜；另一个为特性与之对应相反的SP膜．采用对称膜的设计并用MATLAB语言进行了仿真优化，得到了总层数为21，厚度分别为1586．8nm和2157．8nm的LP膜和SP膜，该膜系在整个波段和较大角度范围内都具有很好的透反特性．考虑多层薄膜制备中存在材料折射率和膜层厚度偏差，该设计膜系具有较大的制造容差．The structure and principle of an optically written display based on up conversion of near infrared light is presented. In order to improve the screen luminance and avoid the leakage of infrared light, two multi-layer interference filters are designed for the display. One is called LP filter, which has low transmittance for visible light between 420 - 800 nm, and a high transmittance for infrared light between 800-1000 nm; The other is called SP filters with opposite characteristics. Layer-symmetric films are used to design the filters and MATLAB is used to simulate and optimize the design. The obtained LP and SP filters have good characteristics within the whole wavelength bandwidth and the incident angles of 0°30°. The 21-layer LP and SP filters have a total thickness of 1586.8 nm and 2157.8 nm, respectively. The manufacturing tolerances on material refractive index and film thickness are reasonably large.

关 键 词：干涉过滤膜 近红外光上转换发光 显示器 优化算法 

分 类 号：O484.4[理学—固体物理]