聚合物阵列波导光栅的制作技术  

Fabrication Technology of Polymer Arrayed Waveguide Grating

作　　者：张国伟[1] 鄂书林[1] 邓文渊[1] 许英朝[1] 唐晓辉[1] 张大明[2] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室 [2]吉林大学集成光电子国家重点实验室,吉林长春130021

出　　处：《发光学报》2006年第3期413-416,共4页Chinese Journal of Luminescence

基　　金：中科院长春光学精密机械与物理研究所现代光学创新基金(C03Q14Z);长春市科技计划基金(05GG13)资助项目

摘　　要：研究了聚合物阵列波导光栅AWG制作的几个关键技术。首先,为了克服反应离子刻蚀过程中单独使用光刻胶作掩膜而导致的光波导形状和尺寸偏离设计的缺点,采用了光刻胶与金属掩膜相结合的双掩膜技术进行器件制作。详细介绍了双掩膜技术制备聚合物AWG的过程,并得出铝膜作为掩膜的最佳厚度为100nm左右。测试给出了使用和没有使用双掩膜的对比结果,该结果表明使用双掩膜技术制作的波导质量明显好于单独使用光刻胶作掩膜制作的结果。其次,采用蒸气回溶技术来减小反应离子刻蚀产生的波导表面和侧壁的起伏,从而降低了波导的散射损耗。结果表明,蒸气回溶技术使所制作的波导表面的均方根粗糙度从41.307 nm降低到24.564 nm。Wavelength division multiplexing technology can extend the potentiality of the fiber. Arrayed waveguide grating （AWG） which is based on a phased arrayed of bent optical waveguide, is one of the key devices of dense wavelength division multiplexing （DWDM） optical systems, because it offers multi-channel operation, design flexibility and suitability for mass production. This text described the fabrication of AWG in detail. Using the polymer materials to manufacture AWG, the refracting rate is apt to adjust, the fabrication process is simple and the price is cheap. For the moment, the technology of making waveguide with polymer materials conclude photo bleaching technology, laser scribe technology, ion implantation technology and reactive ion etching technology. The reactive ion etching technology don＇t depend on the material of waveguide. But there is high ion bombardment resulting in high physical damage and poor mask resistance. So the combined layer masks were used in the fabrication of the AWG to compensate the damage of the resist so that the shape and the size of waveguide is probably the same as the design. The combined layer masks are aluminium mask and photo resist. The aluminium is vaporised on the material of the core layer. And then the photo resist is formed by spin-coating. The rotate-speed is 4000 r/s for photo resist. The experiment was carried on mainly using MD-300B vacuum evaporation machine, JKG-3A photolithography machine and ME-2A ion etching machine. It gave the result that 100 nm is the best thickness for aluminium mask. The surface of waveguide became rough after RIE. It＇s not good for waveguide lose to change the parameters during RIE process. So the steam remelting technology is used to modify the scatter lose which is due to the roughness of the surface of the waveguide. The root-mean-square roughness of surface of waveguide was reduced from 41.307 nm to 24.564 nm. The samples of AWG was tested, and the one with combined layer masks has the better property.

关 键 词：聚合物阵列波导光栅 双掩膜 蒸气回溶 

分 类 号：TN929.1[电子电信—通信与信息系统]