NiTi形状记忆合金薄膜的制备及形变特性  

Preparation and application of NiTi shape memory alloy thin films

作　　者：袁振宇[1] 徐东[1] 刘毓舒[2] 蔡炳初[1] 

机构地区：[1]上海交通大学微纳科学技术研究院微米/纳米加工技术国家重点实验室薄膜与微细技术教育部重点实验室,上海200030 [2]上海交通大学材料科学与工程学院,上海200030

出　　处：《功能材料与器件学报》2006年第3期229-232,共4页Journal of Functional Materials and Devices

基　　金：上海市应用材料研究与发展基金(No.0315)

摘　　要：研究了适用于微器件的溅射态N iTi形状记忆合金薄膜。讨论了溅射工艺及织构对薄膜结构和相变特征的影响。利用薄膜热相变特性制成了微驱动器,观察并分析了该器件的形变特性。结果表明:原位加热溅射可以获得具有织构的晶化薄膜;用该薄膜制备的驱动器回复率为0.76%。Sputtered NiTi shape memory alloy （SMA） thin film for microactuator was studied. The processes of fabrication and texture that affect structure and transformation characteristics of thin films were investigated. Microdevice based on SMA thin film was fabricated, and its deformation behavior was analyzed. The results show that the crystallized NiTi thin films with a strong texture of A （110） can be sputter -deposited by in situ heating; The NiTi beam shows a recovering ratio of 0.76% due to the existence of texture.

关 键 词：NiTi薄膜 形状记忆合金 织构 微驱动器 

分 类 号：O484[理学—固体物理]