酞菁钴－表面活性剂薄膜修饰电极及其催化性能  

Cobalt Phthalocyanine-Surfactant Film Modified Electrode and Its Catalytic Properties

作　　者：胡乃非[1] 杨敬[1] 刘婷[1] 曾泳淮[1] 

机构地区：[1]北京师范大学化学系

出　　处：《应用化学》1996年第4期25-29,共5页Chinese Journal of Applied Chemistry

基　　金：国家自然科学基金

摘　　要：将酞菁钴（ＣＯＰｃ）掺入阳离子表面活性剂双十二烷基二甲基溴化铵（ＤＤＡＢ）的氯仿溶液，并涂布于热解石墨电极表面，待氯仿挥发后即制得ＣｏＰｃ－ＤＤＡＢ薄膜电极。循环伏安实验表明，在ＫＢｒ溶液中，该薄膜电极有一对良好且稳定的还原氧化峰，Ｅｐｃ＝－０．４５Ｖ，Ｅｐａ＝－０．２４Ｖ（ｖｓ．ＳＣＥ）。探讨了该体系的电化学行为，估计了该体系的电化学参数。可将该薄膜电极用于催化卤代乙酸的电化学还原。Cobalt phthalocyanine(CoPc)-didodecyldimethylammonium bromide (DDAB) surfactant film electrode could be prepared by casting the mixture of CoPc with DDAB chloroform solution on the surface of pyrolytic graphite electrode and then removing the chloroform by evaporation. Cyclic voltammetric experiments showed that the film electrode in KBr solution had a pair of well-defined and stable reduction and oxidation peaks at Epc=0. 40 V and Epa=-0. 36 V(vs. SCE),respectively.The electrochemistry of this system was studied and the electrochemical parameters were estimated. The CoPc-DDAB film electrode could be used to catalyze electrochemical reduction of halogenated acetic acids.

关 键 词：酞菁钴 表面活性剂 薄膜修饰电极 电化学催化 

分 类 号：O657.1[理学—分析化学] O647.2[理学—化学]