Rh／SiO_2上H_2的化学吸附  

Chemisorption of H_2 on Rh/SiO_2

作　　者：陈耀强[1] 龚茂初[1] 明虹[1] 周建略 杜宗英[1] 祝小红 陈豫[1] 

机构地区：[1]四川大学化学系

出　　处：《高等学校化学学报》1996年第8期1295-1296,共2页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金

摘　　要：Ｒｈ／ＳｉＯ_２上Ｈ_２的化学吸附陈耀强，龚茂初，明虹，周建略，杜宗英，祝小红，陈豫（四川大学化学系，成都，６１００６４）关键词Ｒｈ／ＳｉＯ_２催化剂，Ｈ_２化学吸附，ＩＲＨ２在Ｒｈ上的化学吸附被认为是解离化学吸附［１］．而Ｒｈ－Ｈ的红外振动谱带是Ｈ２在...Chemisorption of H2 on 3%Rh/SiO2 prepared by the impregnation of SiO2 with a solution of RhCl3·3H2O has been studied by infrared spectroscopy. When 7. 98 kPa of ultrapure H2 exposed to 3%Rh/SiO2 reduced by H2 at 573 K for 2 h, three bands for Rh- H appeared at 1981,1888 and 1800 cm( -1), respectively. By comparison with CO adsorption on 3%Rh/SiO2 the bands at 1981, 1888 and 1800 cm (-1) can be designated to linear-hydrogen,gemel-hydrogen and bridged-hydrogen.

关 键 词：化学吸附 IR 铑 二氧化硅 氢气 催化剂 

分 类 号：O613.2[理学—无机化学] O647.32[理学—化学]