四价掺杂铌酸锂晶体抗光折变性能研究  

Optical Damage Resistance in LiNbO_3 Crystals Doped with Tetravalent Ions

作　　者：李树奇[1] 刘士国[1] 孔勇发[1] 阎文博[1] 刘宏德[1] 邓东灵[2] 高光宇[2] 李彦波[2] 高宏臣[2] 许京军[1] 

机构地区：[1]南开大学弱光非线性光子学材料先进技术及制备教育部重点实验室,天津300457 [2]南开大学物理科学学院,天津300071

出　　处：《人工晶体学报》2006年第3期474-477,共4页Journal of Synthetic Crystals

基　　金：长江学者和创新团队发展计划资助

摘　　要：我们在同成份铌酸锂晶体中掺入四价离子铪,生长了掺杂浓度分别为2、4、6mol%的掺铪铌酸锂系列晶体。掺铪浓度达到4mol%时,晶体的抗光损伤能力为5×105W/cm2,比同成份纯铌酸锂晶体提高了4个数量级。应用全息法测得掺4、6mol%铪的铌酸锂晶体最大折射率变化为8.7×10-6,与高掺镁(6.5mol%)铌酸锂晶体的类似。晶体的红外吸收谱和紫外-可见光吸收谱也显示,掺杂浓度为4mol%时具有明显的阈值特征。由此可以确定铪离子在铌酸锂晶体中的阈值浓度约为4mol%。Congruent LiNbO3 crystals doped with HfO2 （ 2, 4, and 6mol% ） were grown. The optical damage resistance ability of LiNbO3 ：Hf crystal （4mol%） reached 5 × 10^5 W/cm^2, which is four orders of magnitude higher than that of congruent pure LiNbO3 crystal. The maximum refractive index change of LiNbO3：Hf （4 and 6 mol% ） is about 8.7 × 10^-6, which is almost the same as that of LiNbO3：Mg crystal （6.5mol%）. The OH ^- absorption spectra and UV-visible absorption spectra of these crystals also show that there exits a threshold effect near 4mol% Hf. The doping threshold of Hf for LiNbO3 crystal is considered to be 4mol%.

关 键 词：掺铪铌酸锂晶体 抗光折变 阈值 吸收光谱 

分 类 号：O734[理学—晶体学]