ZnO的用途及其薄膜的制备方法  

Application and Preparation of ZnO Thin Film

作　　者：李海凤[1] 

机构地区：[1]天津职业大学,天津300402

出　　处：《天津职业大学学报》2006年第3期39-41,共3页Journal of Tianjin Vocational Institute

摘　　要：阐述了ZnO薄膜材料的结构特点、电学性质和光学特性,详细介绍了各种制备氧化锌薄膜的方法,包括磁控溅射法、化学气相沉积法、喷雾热解法、溶胶-凝胶法、激光脉冲沉积法、分子束外延法、原子层外延生长法。讨论并比较了各种制备方法的优缺点。The development of the micro-structural, electrical and optical properties Of ZnO thin films is introduced. Various growth techniques of ZnO thin films, includinn mannetro sputterinn, chemical vapor deposition, spray pyrolysis, sol-nel procPSSinn, pulsed laser deposition, molecular beam epitaxy, atomic layer epitaxy and metal omanic chemical vapor deposition were reviewed.The discussion and properties of the ZnO films grown by different growth techniques, together with their strengths and weaknesses.

关 键 词：氧化锌 薄膜 制备技术 

分 类 号：G649.20[文化科学—高等教育学]