沉积角度对MgO介质保护膜性能的影响  

Influence of Deposition Angle on Performance of MgO Protective Layer

作　　者：范玉锋[1] 夏星[1] 刘纯亮[1] 

机构地区：[1]西安交通大学电子物理与器件研究所,西安710049

出　　处：《真空科学与技术学报》2006年第3期181-184,共4页Chinese Journal of Vacuum Science and Technology

基　　金：教育部科学技术研究重大项目(No.0205)

摘　　要：由于介质保护膜的特性极大地影响交流等离子体显示器(AC-PDP)的寿命、功耗和显示质量,所以研究介质保护膜的制备工艺是十分重要的。本文利用电子束加热蒸镀法,在不同沉积角度下制备了MgO介质保护膜和宏单元气体放电屏。利用X射线衍射仪(XRD)和扫描电子显微镜(SEM)对制备的介质保护膜样品的微观结构和表面特征进行了表征,并且,利用宏单元气体放电实验屏研究了介质保护膜的气体放电特性。结果表明:在沉积角度为15°下制备的MgO介质保护膜,薄膜的着火电压最低,晶粒最大,并且结晶取向最强。MgO protective layers, grown by electron beam evaporation at different deposition angles on macro-cell discharge screen in ac plasma display panel （AC-PDP）, were characterized with X-my diffraction （XRD） and scanning electron microscopy （SEM）. The discharge characteristics of the film were also studied with the macro-cell discharge screen. The results show that the deposition angle strongly affects the quality of MgO protective layers. For example, the film grown at a deposition angle of 15° has the lowest fwing voltage, the largest grain sizes and the most pronounced preferred crystal growth orientation.

关 键 词：等离子体显示器 保护膜 沉积角度 着火电压 结晶取向 

分 类 号：O484[理学—固体物理]