金刚石薄膜磁性研磨抛光研究  

Study on Magnetic Abrasive Polishing for Diamond Thin Films

作　　者：王谦[1] 孙玉华[1] 孙方宏[2] 

机构地区：[1]同济大学职业技术教育学院,上海200092 [2]上海交通大学机械与动力工程学院,上海200030

出　　处：《机械工程师》2006年第7期52-54,共3页Mechanical Engineer

摘　　要：表面粗糙度是影响金刚石薄膜广泛应用的主要因素,选择一种合适的抛光方式可以大幅度降低表面粗糙度,以加速其商业化应用的进程。文中针对内孔金刚石薄膜,提出了一种新的抛光方法——磁性研磨抛光。实验结果表明,可有效除去薄膜晶粒外缘的尖角,而且不会造成涂层的损伤,不影响涂层附着力,是一种温和的抛光方法,可以达到比较理想的抛光效果,采用磁性研磨抛光的金刚石涂层铜杆拉丝模,工作寿命比硬质合金模具提高8-10倍,满足了铜杆拉丝对模具内孔表面光洁度的更高要求。Rough surface is the obstacle to the application of diamond thin film.A good polishing method can improve great potential for commercializing.In this paper,we propose a new polishing technology for polishing diamond this film with magnetic abrasive polishing.Experiment results indicate that it is efficient to remove sharp-angle of crystals without injuring thin films.Magnetic abrasive polishing is a facile method,and can reach a better effect.Diamond coated drawing dies of the copper wire using magnetic abrasive polishing may prolong the working life eight to ten times than traditional cemented carbide dies.can meet the demand of smoothness on the interior hole of drawing dies during copper wire drawing.

关 键 词：金刚石薄膜 磁性研磨 抛光 

分 类 号：TG580.68[金属学及工艺—金属切削加工及机床]