光敏性有机硅丙烯酸酯的合成及表征  

Synthesis and characterization of photosensitive silicone acrylate

作　　者：刘长利[1] 吴文健[1] 张学骜[1] 钱斯文[1] 吴晓森[1] 

机构地区：[1]国防科技大学航天与材料工程学院,长沙410073

出　　处：《化工新型材料》2006年第6期42-44,共3页New Chemical Materials

基　　金：863创新基金项目(2003AA005017)

摘　　要：以含氢硅油和三缩丙二醇二丙烯酸酯(TPGDA)为原材料,氯铂酸为催化剂,采用硅氢加成方法直接合成了光敏性有机硅丙烯酸酯。探讨了反应时间、反应温度、溶剂、催化剂用量以及阻聚剂用量等因素对反应的影响,对反应产物进行了红外光谱分析,对产物的光固化性能进行了研究。In this paper, a novel photosensitive silicone acrylate was synthesized from hydrogen-containing silicone fluid （PHDS） and multifunctional organic acrylate （TPGDA） by a very convenient route of the direct hydrosilylation, using chloroplatinic acid as the catalyst. The influence of reaction time, reaction temperature, solvent, catalyst content and polymerization inhibitor content was investigated. The structure of reaction product was characterized by IR spectrum. Photo-curability of the photosensitive silicone acrylate was also measured.

关 键 词：有机硅 丙烯酸酯 光敏性 光固化 

分 类 号：O627.41[理学—有机化学]