用于集成电路低压压敏陶瓷材料的研究  

Research of Low Voltage Varistor Ceramic Material for IC

作　　者：朱传琴[1] 张录周 范坤泰[3] 

机构地区：[1]山东电力高等专科学校,济南250002 [2]山东沂光电子公司,山东临沂276003 [3]山东大学信息科学与工程学院,济南250061

出　　处：《半导体技术》2006年第8期603-606,共4页Semiconductor Technology

摘　　要：介绍了低压压敏陶瓷的导电机理、研究途径,实验并分析了掺入TiO2、籽晶和稳定剂Ta2O5对材料性能的影响及作用原理,做出了适合集成电路用的低压压敏陶瓷材料。The transmitting electric current mechanism and the development of low voltage varister ceramic were introduced. The experiments and analyzing on the mechanism of doping TiO2 to the material, affecting the material by the crystalline, grain, and a steady Ta2O5 chemical preparation were done. The low voltage varister ceramic material was successfully made for IC manufacturing.

关 键 词：低压压敏陶瓷 晶粒 晶界 富铋相 

分 类 号：TN379[电子电信—物理电子学] TN304.82