聚L－缬氨酸修饰石墨电极不对称还原苯甲酰甲酸  

Asymmetric Reduction of Phenylglyoxylic Acid Using Poly-L-Valine Modified Graphite Electrode

作　　者：陈刚[1] 陆嘉星[1] 徐承天[1] 高剑南[1] 陈良[1] 张五昌 

机构地区：[1]华东师范大学化学系,上海医科大学基础医学院

出　　处：《应用化学》1996年第6期78-80,共3页Chinese Journal of Applied Chemistry

基　　金：国家自然科学基金

摘　　要：聚Ｌ－缬氨酸修饰石墨电极不对称还原苯甲酰甲酸陈刚，陆嘉星，徐承天，高剑南，陈良，张五昌（华东师范大学化学系上海２０００６２）关键词聚Ｌ－缬氨酸，修饰电极，不对称还原，苯甲酰甲酸近年来，用化学修饰电极进行不对称合成日益受到人们重视［１，２］．Ｎｏｎａｋ...Poly-L-valine was modified on graphite to produce polymer modified graphite electrode(Ce/PLV) on which phenylglyoxylic acid(PGA) was reduced to S(+)-mandelic acid(SMA).By using Ce/PLV,the optical yield(o.y.) of SMA and conversion percent of PGA were measured as functions of various factors.The highest o.y.obtained under optimized conditions was 63.8%.A possible stereochemical model of asymmetric reduction of PGA was proposed.

关 键 词：聚L-缬氨酸 修饰电极 不对称还原 苯甲酰甲酸 

分 类 号：O625.511[理学—有机化学]