慢正电子束研究电子束固化涂层的微观结构  

A STUDY OF MICROSTRUCTURE OF EBC COATING BY SLOW POSITRON BEAM

作　　者：郑万辉[1] 俞方华 童永彭 吴桂刚 翁惠民[1] 邓斌 戴毅刚 

机构地区：[1]中国科学院上海原子核研究所,中国科学技术大学近代物理系,上海宝山钢铁(集团)公司钢铁研究所,中国科学院高能物理所

出　　处：《辐射研究与辐射工艺学报》1996年第4期201-205,共5页Journal of Radiation Research and Radiation Processing

基　　金：上海市自然科学基金

摘　　要：用慢正电子束多普勒展宽谱研究环氧丙烯酸酯（ＥＡ）体系电子束固化（ＥＢＣ）涂层。Ｓ－Ｅ曲线给出了稀释剂分子结构及其相对含量、辐射剂量、预聚物和交联剂含量等对ＥＢＣ涂层微观结构的影响，以及随深度变化的信息。The electron beam curred(EBC) coating composed of epoxyacrylates resin as oligomer have been used in vast area. The microstructure of the coating is closely correlated with moleculers structure the components and radiation dose during curing. The S-parameter of positron annhilation doppler broadening was measurred as a function of positron energy to study electron irradiation induced polymerization and crosslinking. The correlations of S-parameter with content, moleculers structure of reactive diluent, and irradiation dose were observed.

关 键 词：电子束固化 涂层 慢正电子束 环氧丙烯酸酯 

分 类 号：TQ225.24[化学工程—有机化工]