等离子体浓度对离子撞击材料表面能量通量的影响  

Effect of Plasma Density on Ion Energy Flux Colliding on the Material Surface

作　　者：李志刚[1] 丁玉成[1] 

机构地区：[1]西安交通大学机械制造系统工程国家重点实验室,西安710049

出　　处：《电工技术学报》2006年第7期10-14,共5页Transactions of China Electrotechnical Society

基　　金：国家高技术研究发展计划(863计划)重点资助项目(2002AA420050);国家重点基础研究发展计划(973计划)资助项目(2003CB716202);国家自然科学基金资助项目(50275118)

摘　　要：研究了射频鞘层中离子轰击材料表面的能量通量与等离子体浓度之间的关系。在射频鞘层模型基础上,推出了离子轰击材料表面的速度、浓度及能量通量的表达式。分析了等离子体浓度对离子能量通量的影响。实验数据与理论分析有较好吻合,验证了理论分析的正确性。等离子体浓度对离子能量通量起双重作用:一方面,等离子体浓度的增加削弱离子能量;另一方面,等离子体浓度增大使轰击材料表面离子的数量增加。等离子体浓度较低时,前者的作用较大并且影响比较显著;随等离子体浓度升高,后者的作用增大,并且等离子体浓度对离子能量通量的影响趋于平缓。The relationship between the ion energy flux colliding on the material surface and the plasma density is investigated. Based on the radio frequency sheath model, the equations for ion velocity, density, and energy flux colliding on the material surface are derived. The effect of plasma density on the ion energy flux is analyzed. The experimental data are in agreement with the theoretical analysis and verify the analysis. Plasma density plays dual effects on ion energy flux, including the restraint of the ion energy in the sheath and the impelling of the ion number colliding on the material surface. When the plasma density is relatively low, the former plays a dominant role and its effect on energy flux is significant; as plasma density grows higher, the latter plays a more important role and the effect of plasma density tends towards weaker.

关 键 词：等离子体 浓度 离子 表面 能量通量 

分 类 号：TM405[电气工程—电器]