钴镍基磁性薄膜的研究现状及进展  

State and Advancement of Cobalt-Nickel Based Magnetic Thin Films

作　　者：张路长[1] 宣天鹏[1] 琚正挺[1] 

机构地区：[1]合肥工业大学材料科学与工程学院,安徽合肥230009

出　　处：《金属功能材料》2006年第4期25-28,共4页Metallic Functional Materials

基　　金：国家自然科学基金资助项目(50371023)

摘　　要：介绍了广泛应用于电子行业的钴镍基磁性薄膜,讨论了磁性薄膜的分类、制备方法、钴镍基磁性薄膜的应用领域以及当前研究的发展趋势。磁性薄膜按其性能的不同一般可以分为软磁薄膜、磁记录薄膜、磁光记录薄膜等。其制备方法有溅射法、电镀法、化学镀法等。钴镍基磁性薄膜的研究主要集中在稀土介入、纳米领域以及非晶态镀层领域,可以看出这些领域也是钴镍基磁性薄膜今后的研究方向。Cobalt-nickel based magnetic thin films which have been widely used in electronic industry are presented. The classification of magnetic thin films, manufacturing methods and application fields of cobalt-nickel based magnetic thin films are discussed as well as the trend of the current study. Generally, magnetic thin film can be classified into three different kinds：the soft magnetic thin film, the magnetic recording thin film and the magnetic-optical recording thin film, according to their behaviors. And sputtering, electro-less plating, electro-plating are applied to produce these films. Rare-earth interposition, magnetic thin film in nano-material and amorphous plating layer are emphasized in current study. Thus, the trend of cobalt-nickel based magnetic thin film can be concluded with the former discussion.

关 键 词：钴镍基磁性薄膜 化学镀 电镀 磁记录薄膜 

分 类 号：TB383.2[一般工业技术—材料科学与工程]