工艺参数对电化学制备钨酸钡多晶薄膜形貌影响的研究  

Effects of processing conditions on the morphology of crystallized BaWO_4 film prepared by an electrochemical method

作　　者：金晓玲[1] 余萍[1] 肖定全[1] 陈连平[1] 杨祖念[1] 毕剑[1] 

机构地区：[1]四川大学材料科学与工程学院,四川成都610064

出　　处：《功能材料》2006年第7期1030-1032,1035,共4页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50410179);面上资助项目(50372042);霍英东青年教师基金资助项目(94008)

摘　　要：采用恒电流电化学技术,在一定浓度Ba(OH)2溶液中,于室温环境下在金属钨片上制备了BaWO4多晶薄膜。利用XRD和SEM测试手段分析表征了薄膜的晶相和表面形貌;对比讨论了金属钨片表面质量、电流密度以及溶液浓度对沉积薄膜的表面形貌及晶粒生长形态的影响。研究表明,在本实验条件下制得的BaWO4多晶薄膜均具有单一的四方相结构;衬底表面质量对沉积薄膜的表面平整度有很大的影响;电流密度的大小影响晶粒几何尺寸;晶粒显露面族及几何外形因溶液浓度的改变而变化。Using a constant direct current technique,crystallized BaWO4 films with scheelite-structure have been prepared on anodic tungsten substrates in Ba（OH）2 solutions at room temperature. The deposited films were characterized by XRD and SEM technique, and effects of processing conditions （substrates quality, current density and solution concentration） on the growing characteristics of films have been discussed. The research results indicated that BaWO4 films prepared in our experiments were all tetragonal phase; the qualities of as-grown films relied on the roughness of substrate surface;current density affected size of the crystalline grains;and the solution concentration influenced the appearance of film grains.

关 键 词：BaWO4 恒电流技术 电化学 薄膜 

分 类 号：TB383[一般工业技术—材料科学与工程] O646.542[理学—物理化学]