多边形线算法分析及应用  

Polygonal line algorithm analysis and its application

作　　者：马杰[1] 滕建辅[1] 关欣[1] 董健[1] 

机构地区：[1]天津大学电子信息工程学院,天津300072

出　　处：《电路与系统学报》2006年第4期94-99,共6页Journal of Circuits and Systems

摘　　要：针对硅晶片点缺陷模式分析中，线状点缺陷集难以检测这个问题，本文从Hastie和Kegl提出的主曲线理论出发，分析了多边形线算法原理及实现细节，并将该算法应用到硅晶片线状点缺陷检测中去，通过多组实验证实多边形线算法收敛速度快，计算准确，能够达到点缺陷模式分析的应用要求。In pattern analysis of wafer defects, the detection of curvilinear defects set is often more difficult. Based on theo^J of principal curve presented by Hastie and Kegl, the principle and realization of polygonal line algorithm is discussed in the paper. When the algorithm is used in the detection of curvilinear defects on wafer map, it can converge fast, compute accurately and meet the demand of application of defect pattern analysis.

关 键 词：主曲线 自相和 拟牛顿法 硅片点缺陷 

分 类 号：TN307[电子电信—物理电子学]