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机构地区:[1]常州工学院化学系,常州213002 [2]浙江大学化学系,杭州310027
出 处:《金属学报》2006年第8期857-860,共4页Acta Metallurgica Sinica
基 金:国家自然科学基金50499336和50571090
摘 要:应用电化学阻抗谱(EIS)技术以单槽和串联双槽两种方式测量了同一环氧涂层金属样品5个测试点在浸泡过程中阻抗行为的变化.通过两种测试方式中涂层金属体系各测量点的极化电阻R_p(R_p=R_c+R_(ct)+R_(diff))间的关联性,说明了涂层金属的EIS双槽检测技术的可靠性.实验结果表明:同一样品两个测试点的阻抗差别较大时,采用串联双槽测量的总阻抗值与其中的高阻抗测试点的阻抗值更为接近,两个测试点单槽测量的R_p(R_c+R_(ct)t+R_(diff))之和(ΣR_(pi))与双槽测量的R_p间存在较大偏差;阻抗相近的两个测试点进行串联测量时,R_p近似等于两点分别以单槽方法所得R_p之和(ΣR_(pi));两个测试点的阻抗均较小时,串联后测得的R_p与两点单独测量的R_p之和间存在较大偏差.The single- and series double-cell compartments were used to study the impedance behaviors of five sites on the epoxy-covered metal. The experimental results suggested that in the case of big difference in impedance value of two selected sites, the total impedance between the two sites obtained by double-cell method is close to that of the site with higher impedance, and the relative error between a sum of Rp of the two sites obtained by single-cell method and that obtained by double-cell method is large. If impedance values of two sites are similar, the total Rp measured by double-cell compartment almost equals to the sum of Rp obtained by single-cell method, and the relative error is small. But when both impedance values of two sites axe small, there was big relative error between Rp obtained by double-cell method and the sum of Rp measured by single-cell way on the same two sites.
分 类 号:TG174.3[金属学及工艺—金属表面处理]
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