铁电材料激光刻蚀系统中的PID微机控制技术  

PID Control Technology in the Laser Etching System for Ferroelectric Materials

作　　者：夏丽昆[1] 侯阳[2] 李银柱[2] 太云见[2] 袁俊[2] 莫启元 

机构地区：[1]总装重庆军代局驻昆明地区军代室,云南昆明650223 [2]昆明物理研究所,云南昆明650223

出　　处：《红外技术》2006年第8期489-492,共4页Infrared Technology

摘　　要：国内外已研究的网格化技术包括离子束刻蚀和激光化学辅助刻蚀。由于铁电体材料不易减薄至20μm以下,而且像元中心距也在逐步减小,采用离子束刻蚀技术实施网格化很困难。因此,为实现热释电非制冷焦平面探测器的网格化,减小热串音,提高器件的空间分辨率,采用了一套基于PID微机控制技术的激光化学辅助刻蚀系统对铁电材料进行了网格化刻蚀,较好地解决了大列阵铁电材料探测器的网状技术这一难题。The developed gridding technology includes ion etching and laser assisted etching. The ion etching reticulation is very diffcult for ferroelectric materials due to thickness limitation as well as narrow distance between pixels. In order to minimize cross-talking and improve the resolution, a laser assisted etching system based on PID control technology was adopted for reticulation of ferroelectric wafers and it effectively solved the reticulation problem in large area ferroelectric wafers.

关 键 词：铁电材料 激光刻蚀 PID控制技术 

分 类 号：TN213[电子电信—物理电子学]