溅射超薄Ag膜中的晶格畸变  

Lattice Distortion of Ultrathin Silver Films Prepared by Sputtering Deposition

作　　者：孙兆奇[1] 曹春斌[1] 宋学萍[1] 

机构地区：[1]安徽大学物理与材料科学学院,安徽合肥230039

出　　处：《稀有金属》2006年第4期444-447,共4页Chinese Journal of Rare Metals

基　　金：国家自然科学基金(59972001);安徽省自然科学基金(01044901);安徽省教育厅科研基金(2003kj025);安徽省教育厅科研基金(2004kj030);安徽省人才专项基金(2004Z029);安徽大学人才队伍建设基金资助课题

摘　　要：用直流溅射法制备了厚度从11.9到189.0 nm的超薄Ag膜。X射线衍射(XRD)分析表明:样品中的Ag均为面心立方多晶结构,粒径从6.3到14.5 nm。通过晶格常数的计算发现:晶格畸变为收缩,且随着粒径的减小收缩率增加,最大值为1.1%。结合不同方法制备纳米Ag材料的研究结果,讨论了影响晶格畸变的主要因素。Uhrathin silver films （ 11.9, 33.3, 66.6,83.7, 97.7 and 189.0 nm） were successfully prepared by direct current sputtering deposition method.The microstructures of the films were analyzed by using X-ray diffractometer. The results show that Ag maintains its fcc crystal structure with the mean grain size ranging from 6.3 nm to 14.5 nm. Lattice contraction was found through the calculation of lattice constant.The biggest contraction percentage is 1.1%. The factors affecting the lattice distortion were also discussed.

关 键 词：直流溅射 超薄Ag膜 晶格畸变 

分 类 号：O484[理学—固体物理]