组合镀膜法制备集成滤光片列阵  

Integrated filter array fabricated by using the combinatorial deposition technique

作　　者：王少伟[1] 李明[2] 夏长生[1] 王海千[2] 陈效双[1] 陆卫[1] 

机构地区：[1]中国科学院上海技术物理研究所红外物理国家重点实验室,上海200083 [2]合肥微尺度物质科学国家实验室(筹)中国科学技术大学-Shincron联合实验室中国科学技术大学,安徽合肥230026

出　　处：《光学仪器》2006年第4期124-128,共5页Optical Instruments

基　　金：国家自然科学基金资助项目(60508018);上海市青年科技启明星计划资助项目(05QMX1459);973资助项目(2001CB6104)

摘　　要：为实现集成滤光片列阵在单片衬底上的高效制备,提出组合镀膜法,通过磁控反应溅射,以N b2O5和S iO2为介质材料,仅通过8次镀膜就成功制备出了集成64通道的滤光片面阵。滤光片面阵的总体尺寸只有12mm×12mm,各个滤光片通道基本呈线性分布在720.5nm^877.2nm之间,带宽在1.82nm^3.92nm之间。结果表明,组合镀膜法是一种高效的集成滤光片列阵制备方法。A combinatorial deposition technique is developed to fabricate integrated filter arrays on a single substrate in high efficiency. An array integrated with 64 narrow band-pass filters （NBPFs） has been successfully fabricated by using a reactive magnetron sputtering system with only a eight-step deposition process, with Nb2O5 and SiO2 as dielectric materials. The total size of the filter array is only 12mm × 12mm. The channels of the 64 filter elements distribute almost linearly from 720. 5nm to 877.2nm. Their bandwidth is between 1. 82nm and 3. 92nm. The results show that combinatorial deposition technique is a high-efficient method for the fabrication of integrated filter arrays.

关 键 词：组合 镀膜 集成 滤光片 列阵 

分 类 号：TN256[电子电信—物理电子学]