膜厚均匀性函数的分析  

Analysis of film layer thickness uniformity function

作　　者：高晓丹[1] 张晓晖[1] 陈清明 潘峰 

机构地区：[1]海军工程大学兵器工程系,湖北武汉430033 [2]武汉金石凯激光技术有限公司,湖北武汉430074

出　　处：《光学仪器》2006年第4期154-158,共5页Optical Instruments

摘　　要：为了解决膜层层数在一百多层以上的膜系在镀制过程中所必然存在的膜厚均匀性问题,定义了一个与镀膜机的结构参数、工艺参数以及基片几何参数均有关系的均匀性函数。以APS1104镀膜机为实验对象,针对多腔窄带滤光片膜系,根据此函数分析了镀膜机镀制较多层数薄膜时,其膜层厚度沿基片径向的变化规律,确定了影响膜厚均匀性的多种因素,解释了镀制多腔窄带滤光片薄膜成品率低的原因。实验结果证实了分析的正确性。In order to solve the question about uniformity of multiple layers film which is inevitably for more than one hundred film layers. A uniformity function is defined in this paper, which is about the structure parameters of the depositing machine and the technics parameters and the geometry parameters of the substrate. The type APS1104 depositing machine is chosen for multiple cavity narrow-band pass filter. According to the function, the principle of film layer thickness along the radius is analyzed when depositing multilayer coating, the factors which affect the uniformity of multilayer film thickness are confirmed, the reason of low product rate about multiple cavity narrow-band filter is explained. The experiment result confirms the validity of the analysis.

关 键 词：窄带滤光片 均匀性 APS1104镀膜机 蒸发特性 

分 类 号：O484.4[理学—固体物理]