平行磁场对电沉积镍铁合金显微组织的影响(英文)  

Microstructure Analysis of NiFe Films Electrodeposited in the Parallel Magnetic Field

作　　者：温艳玲[1] 钟云波[1] 任忠鸣[1] 邓康[1] 徐匡迪[1] 

机构地区：[1]上海大学上海市现代冶金与材料制备重点实验室,上海200072

出　　处：《稀有金属材料与工程》2006年第A02期325-330,共6页Rare Metal Materials and Engineering

基　　金：Supported by NSFC(50574055);Science Foundation Committee of Shanghai,China(03JC14029)

摘　　要：针对0 T～12 T平行强磁场下电沉积镍铁膜的微观形貌、晶体取向和成分进行了比较和分析。研究发现:无磁场时样品以树枝晶形式由基片向外生长,而强磁场下样品的二次枝晶生长受到抑制,主轴逐渐细化,主轴间距逐渐减小,12 T磁场下,样品的二次枝晶退化为小的胞状晶,且主轴呈现出断裂趋势;强磁场下的电沉积样品晶体发生了择优取向;匀强磁场中磁致对流对镍铁合金膜的成分没有影响,梯度磁场中梯度磁化力使镀层铁含量提高。This paper investigated the microstructure of NiFe films electrodeposited in different high magnetic fields. The direction of the magnetic field is parallel to that of electric current. It is found that the fir-tree crystals grow forth from the substrate in the absence of magnetic field. With the enhancement of the superimposed static magnetic field, the growth of secondary dendritic crystals was restrained, and the diameter and the space length of spindle arms decreased gradually. When the magnetic flux density （MFD） was equal to 12 T, the secondary dendritic crystal dwindled into cellular structure and the spindle fracture was found. The crystal was oriented to the high static magnetic field above 4 T, however there was no distinct change with the increase of MFD. The iron content of the electrodeposited NiFe film was not affected by the magnetohydrodynamic （MHD） effect but markedly by the magnetizing force.

关 键 词：强磁场 电沉积 微观结构 磁致对流效应 磁化力 

分 类 号：TG113.1[金属学及工艺—物理冶金]