晶体不均匀性的“魔镜”诊断方法  

MAGIC MIRROR APPROACH AND DIAGNOSIS OF IMPERFECTIONS IN CRYSTALS

作　　者：邓江东[1] 张光寅[1] 李增发 

机构地区：[1]南开大学物理系

出　　处：《南开大学学报（自然科学版）》1996年第4期47-52,共6页Acta Scientiarum Naturalium Universitatis Nankaiensis

摘　　要：“魔镜”检测方法已被有效地应用于镜状表面缺陷的检测．在本文中，我们基于“局域波面畸变”概念，发展了晶体缺陷的“魔镜”检测原理，并提出了两种分别用于晶体表面及内部缺陷的无损检测方法．用这些方法，我们分别观测到硅外延片上的多种典型缺陷图样，以及ＬｉＮｂＯ３；Ｆｅ晶体中光伤点等缺陷．The'magic mirror' (MM) approach has been used effectively to detect various flaws on mirror-like surface. In this paper, a MM approach is improved by using homogeneous laser beam with perfect wave-front. Two kinds of MM instruments, the R-MM and the T-MM, are established for evaluating the mirror-like surfce and transparent crystals, respectively. Various St epi-wafers are diagnosed and some typical patterns ofsurface flaws are observed. Some results of detecting optical damaged spots and abnormal growth area in Fe: LiNbO3 crystal sheet are also reported.

关 键 词：魔镜方法 晶体缺陷 检测 均匀性 

分 类 号：O77[理学—晶体学]