光学薄膜残余应力分配预测模型计算方法研究  

Calculation method of predictive model for residual stress distribution in optical thin films

作　　者：张耀平[1] 许鸿[1] 凌宁[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所

出　　处：《应用光学》2006年第2期108-111,共4页Journal of Applied Optics

基　　金：国家863课题资助项目

摘　　要：残余应力是光学薄膜研究的一个重要组成部分,它对光学元器件有很大的影响。根据弹性力学原理,基于应变不匹配,提出了一种可以预测薄膜残余应力分配的理论模型计算方法,并将计算结果与干涉仪测量值进行了对比。利用所建立的模型分析了薄膜参数变化时基底残余应力的变化情况。结果表明:所建模型合理;随着镀膜温度的增加,基底总残余应力随镀膜温度升高而呈增大的趋势;本征应力变化不太大;随着基底厚度的减小,基底上下表面应力呈增大的趋势,而薄膜应力则呈减小趋势,但变化趋势很小。基底的中心轴约位于基底上表面以下2/3处。The residual stress is an important factor for optic thin film quality,and it has an adverse effect on the optical components. Based on the principle of elasticity and strain misfit, a new calculation method of theoretical model to predict the residual stress distribution on optical thin films is put forward in this paper. The calculated result was compared with the result obtained by an interferometer. The variation of the residual stress of the substrate with parameters of optical thin films was analyzed with the model we set up. The results indicate the model is rational, the total residual stress of the substrate increases when coating temperature rises, intrinsic stress changes little, and the stress of upper and lower surfaces of substrate increases but the stress of thin film decreases when the thickness of the substance is reduced. The central axis of substrate is approximately located at the position of 2/3 below the upper surface of substrate.

关 键 词：薄膜 残余应力 预测模型 

分 类 号：O484.1[理学—固体物理]