噻吩在猝冷骨架Ni上吸附脱硫的XPS研究  

XPS Study on Adsorptive Desulfurization of Thiophene over Rapidly Quenched Skeletal Ni

作　　者：谢福中[1] 胡华荣[1] 乔明华[1] 闫世润[1] 范康年[1] 雷浩[2] 谭大力[2] 包信和[2] 宗保宁[3] 张晓昕[3] 

机构地区：[1]上海市分子催化和创新材料重点实验室,复旦大学化学系上海200433 [2]中国科学院大连化学物理研究所催化基础国家重点实验室,大连116023 [3]石油化工科学研究院,北京100083

出　　处：《高等学校化学学报》2006年第9期1729-1732,共4页Chemical Journal of Chinese Universities

基　　金：国家'九七三'计划(批准号:G2000048009);国家自然科学基金(批准号:20203004);上海市科委科学基金(批准号02ZA14006;03QB14004)资助

摘　　要：采用X射线光电子能谱(XPS)研究了室温下噻吩在猝冷骨架Ni吸附剂上的吸附及受热分解行为.研究结果表明,298K时噻吩首先在吸附剂表面发生C—S键断裂,生成原子硫及含金属的有机环状化合物.当吸附剂表面完全被解离物种覆盖后,发生噻吩的多层物理吸附.加热至373K,大部分物理吸附的噻吩直接脱附,其余部分在碳物种脱附后暴露的Ni表面上发生解离.473K时表面的碳物种消失,而残留在样品上的硫均转化为硫化镍.The adsorptive desulfurization of thiophene on rapidly quenched skeletal Ni （RQ Ni） was investigated by XPS. At 298 K, thiophene in direct contact with RQ Ni undergoes C-S bond scission, forming metallocycle-like species and atomic sulfur on metallic nickel. Further exposure to thiophene leads to physisorbed thiophene. At 373 K, most of the physisorbed thiophene desorbs, with a small portion undergoing sulfur abstraction on the newly exposed nickel surface. The existence of alumina and hydrogen may block the further cracking of the metallocycle-like species at higher temperatures, which has＇been considered to be the dominant reaction pathway on Ni single crystals. At 473 K, the C1s peak disappears, leaving nickel sulfide on the surface.

关 键 词：猝冷镍 噻吩 吸附脱硫 X射线光电子能谱(XPS) 

分 类 号：O643.1[理学—物理化学]