镁合金阳极氧化膜腐蚀过程的电化学阻抗谱研究  被引量:7

EIS Study on Corrosion Process of Anodized Film on AZ91D Magnesium Alloy

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作  者:钱建刚[1] 李荻[1] 王纯[1] 郭宝兰[1] 

机构地区:[1]北京航空航天大学,北京100083

出  处:《稀有金属材料与工程》2006年第8期1280-1284,共5页Rare Metal Materials and Engineering

基  金:北京市自然科学基金(2032009);航空科学基金(03H51016)

摘  要:采用阳极氧化工艺对AZ91D镁合金进行表面处理,利用电化学阻抗谱(EIS)方法研究AZ91D镁合金阳极氧化膜层在3.5%NaCl溶液中的腐蚀过程。根据腐蚀过程阻抗谱的变化特点,分别采用R(RQ)(RQ)模型和R(Q(R(RQ)))模型的等效电路来拟合阳极氧化膜层在孔蚀诱导期和在孔蚀发展期的电化学阻抗谱图。结果表明:在孔蚀诱导期,随浸泡时间的延长,溶液电阻Rsol和多孔层的电容Yp有所增大,多孔层电阻Rp和阻挡层电阻Rb逐渐减小,弥散效应指数np值基本不变,而阻挡层的电容Yb和弥散效应指数nb无明显的规律性;在孔蚀发展期,随浸泡时间的延长,溶液电阻Rsol,弥散效应指数n1和蚀孔内的反应电阻R2逐渐减小,电容Y1逐渐增大,而蚀孔内溶液电阻R1,蚀孔内阳极金属/介质界面的常相位角元件Q2的电容Y2及弥散效应指数n2无明显的规律性。Corrosion process of the anodized film on AZ91D magnesium alloy's surface in 3.5% NaCl aqueous solution was investigated with electrochemical impedance spectroscopy (EIS). According to the characteristic of EIS in the corrosion process, the EIS of anodized film at the initiation stage and at the propagation stage of pitting corrosion were simulated using the equivalent circuit of R(RQ)(RQ) and R(Q(R(RQ))) models, respectively. The results show that the solution resistance Rsol and the Yp of porous layer increased, and the resistance Rp of porous layer and the resistance Rb of dense layer decreased gradually. The np value almost unchanged and the Yb and nb of dense layer have no obvious regularity with prolonged of immersion time at the initiation stage of pitting corrosion. The solution resistance Rsol, the n1 value and the reaction resistance R2 in corrosion pit decreased, while the Y1 increased, the solution resistance R1, the Y2 and n2 of metal/medium interface for the anode in corrosion pit have no substantial regularity with prolonging the immersion time at the propagation stage of pitting corrosion.

关 键 词:镁合金 阳极氧化膜 电化学阻抗谱 

分 类 号:TG172[金属学及工艺—金属表面处理]

 

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