Ti含量对FePt/Ti_x(FePt)_(100-x)薄膜微结构和磁特性的影响  

Effects of Ti on the Microstructures and Properties of FePt/Ti_x(FePt)_(100-x) Films

作　　者：张玉杰[1] 赵建国[2] 孙会元[1] 于红云[1] 封顺珍 

机构地区：[1]河北师范大学物理科学与信息工程学院,河北石家庄050016 [2]河北省教育考试院社会考试处,河北石家庄050091

出　　处：《河北师范大学学报（自然科学版）》2006年第5期535-537,共3页Journal of Hebei Normal University：Natural Science

基　　金：国家自然科学基金资助项目(10274018);河北省教育厅科学研究基金资助项目(2002116);河北师范大学重点学科资助项目(Z200102)

摘　　要：应用直流对靶磁控溅射法在玻璃基片上沉积了FePt/Tix(FePt)100-x薄膜,并在真空中进行原位退火.研究表明,衬底层Ti含量对FePt/Tix(FePt)100-x薄膜的微结构和磁特性影响很大.在退火温度为550℃,衬底层中的Ti含量为78%条件下,FePt形成了高度有序的L10织构,表面颗粒尺寸分布均匀,粒径减小到11 nm,矫顽力达到最大.FePt/Tix （FePt）100-x films were prepared by DC facing target magnetron sputtering system onto glass substrate and subsequently in situ annealed in vacuum. The microstructures and magnetic properties of FePt/Tix （FePt）100-x films depended on the content of Ti in underlayer. FePt films were obtained with perfectly ordered L10 texture at Ti concentration up to 78 % and annealed temperature of 550℃. The size of granule was uniform, the minimum granule was about 11nm, HC reached maximum.

关 键 词：对靶磁控溅射 磁记录介质 FePt薄膜 有序L10织构 矫顽力 

分 类 号：O484.43[理学—固体物理] O484.5[理学—物理]