镍-磷-碳-氧化学镀层的制备、表征及1,4-丁炔二醇在体系中的作用  

Characterization of Bright Electroless Ni-P-C-O Coating and Reaction Mechanism of Butyne-1,4-diol as Brightener

作　　者：刘少友[1] 唐文华[1] 邹勇[1] 肖尊宏[1] 

机构地区：[1]贵州师范大学凯里学院,贵州凯里556000

出　　处：《材料保护》2006年第9期10-14,共5页Materials Protection

基　　金：贵州省教育厅自然科学基金资助(2004222)

摘　　要：以铜片为基体，采用中心组合规则得到优化的化学镀镍-磷工艺配方。在优化的配方中加入一定量的1，4-丁炔二醇（BOZ），所得镀层表面形貌及组成结构用扫描电镜与x射线衍射仪进行表征，得到了光亮的Ni-P-C-O镀层，镀层硬度高，耐酸蚀性强；探讨了BOZ在反应体系中的作用机理。结果表明，BOZ不仅是光亮剂，而且参与该体系的氧化还原反应，BOZ分解反应的宏观动力学表现为准一级；当BOZ的初始含量为60～123mg／dm^3时，其参与氧化还原的量与温度和初始浓度呈正相关性，温度起主导作用；当BOZ的初始含量为123～240mg／dm^3时，其参与氧化还原的量与温度和初始浓度呈负相关性，浓度起多导作用。Central combination rule was used to establish the optimized formulation for electroless Ni-P plating on a copper substrate. A bright electroless Ni-P coating was thus prepared by introducing brightener butyne-1,4-diol (coded as BOZ) of proper concentration in the optimized electroless Ni-P bath. The morphology and composition of the resulting bright electroless Ni-P coating were analyzed by means of scanning electron microscopy and X-ray diffraction, while the action mechanism of the brightener was explored as well. It was found that the brightener BOZ took part in the oxidation-reduction reaction during the electroless plating process, and the decomposition of BOZ was characterized by a quasi first-class reaction in terms of the reaction kinetics. Namely, when the initial concentration of BOZ was ranged within 60~123 mg/dm~ 3 , the consumption of BOZ, by way of taking part in the oxidation-reduction reaction, was positively proportional to temperature and the initial concentration, with temperature to be dominant. Contrary to the above, as the initial concentration of BOZ was ranged within 123~240 mg/dm~ 3 , the consumption of BOZ was negatively proportional to temperature and the initial concentration, with the BOZ initial concentration to be dominant. Moreover, the bright electroless Ni-P coating had a high hardness and good resistance to acid attack.

关 键 词：化学镀 镍-磷-氧-碳镀层 1 4-丁炔二醇 光亮剂 表征 作用机理 

分 类 号：TQ153[化学工程—电化学工业]