Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing  

作　　者：江竹青 陶世荃 袁韡 刘国庆 王大勇 

机构地区：[1]College of Applied Sciences, Beijing University of Technology, Beijing 100022

出　　处：《Chinese Physics Letters》2006年第10期2749-2752,共4页中国物理快报（英文版）

基　　金：Supported by the National Key Basic Research Special Foundation of China under Grant No G19990330, and the National Natural Science Foundation of China under Grant No 60377003.

摘　　要：The optical erasure dynamics in a batch-thermal fixing scheme of holographic storage in photorefractive crystals is investigated theoretically and experimentally. The inter-batch optical erasure time constant τF is introduced to specify the optical erasure to compensated gratings, and measured in a sophisticated experiment. The experimental result shows that τF is much longer than the intra-batch optical erasure time constant τE. The difference between τFand τE is fundamental for enhancing nonvolatile storage density.The optical erasure dynamics in a batch-thermal fixing scheme of holographic storage in photorefractive crystals is investigated theoretically and experimentally. The inter-batch optical erasure time constant τF is introduced to specify the optical erasure to compensated gratings, and measured in a sophisticated experiment. The experimental result shows that τF is much longer than the intra-batch optical erasure time constant τE. The difference between τFand τE is fundamental for enhancing nonvolatile storage density.

关 键 词：LITHIUM-NIOBATE STORAGE 

分 类 号：O438.1[机械工程—光学工程]