溅射法制备Al／Pb金属多层膜  

Preparation of Al/Pb metallic multilayer by sputtering

作　　者：郭诗玫[1] 孙勇[1] 王闸[1] 

机构地区：[1]昆明理工大学新材料制备与加工重点实验室,云南昆明650093

出　　处：《电镀与涂饰》2006年第9期20-22,共3页Electroplating & Finishing

基　　金：国家自然科学基金资助项目(50061002)。

摘　　要：通过直流二极溅射法制备了具有不同调制波长和周期的Al／Pb金属多层膜。分别通过扫描电镜、X-射线衍射试验以及能谱对多层膜的表面形貌、断面形貌、结构和组成进行了分析。结果表明,所制备的Al／Pb纳米多层膜既无新相生成也无非晶相产生;在亚微米尺寸范围内,铝和铅的微粒分布均匀;在纳米尺寸范围内,形成了Pb对Al的包覆。The Al/Pb metallic multilayer of different modulation wave and periods was prepared by direct current sputtering. The surface morphology, section morphology, structure and composition of multilayer were analyzed by scanning electron microscope, X-ray diffraction test and energy spectrum test. Results show that neither new phase nor amorphous phase exists in the coating of Al/Pb nanometallic multilayer. The particles of Pb and Al were homogeneously mixed in submicrometer range, and Al was contained in particles in the nanometer range.

关 键 词：直流溅射 Al/Pb纳米金属多层膜 微粒分布 纳米尺寸 

分 类 号：TF821[冶金工程—有色金属冶金]